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patterning device
Traducere "patterning device" în chineză
图案形成装置
a patterning device configured to pattern the radiation beam
图案形成装置，配置成图案化所述辐射束；
using a patterning device to provide a radiation beam with a pattern in its cross-section
使用图案形成装置以在辐射束的横截面上给辐射束提供图案；
In step 808, the corrected beam of radiation is directed onto a patterning device to form a patterned radiation beam.
在步骤808，校正后的辐射束被引导到图案形成装置上以形成图案化的辐射束。
However, in a transmissive lithographic apparatuses, where the radiation beam is transmitted through the patterning device, the article support 3 and electrostatic clamp 1 may be constructed in order to allow the projection beam to pass through.
然而，在透射式光刻设备中，其中辐射束透射通过图案形成装置，物体支撑结构3和静电夹持装置1可以被构造以便允许投影束通过。
Reducing a gain will allow the reticle stage 1020 to rotate about the x and y axes in response to the reaction force and reaction torques from the tilted patterning device 1010.
减小增益将允许掩模板平台1020响应于来自倾斜的图案形成装置1010的作用力和力矩而围绕x和y轴旋转。
Subsequently, in action 33, the beam of radiation is imparted with a pattern in its cross-section by a patterning device, e.g. a mask, to form a patterned beam of radiation.
之后，在动作33中，通过图案形成装置（例如掩模）将图案在辐射束的横截面中赋予给辐射束，以形成图案化的辐射束。
As illustrated in FIG. 8, the patterning device pattern further diffracts the beam B2 into a zero and a first order diffracted beam, respectively beams DB20 and DB21.
如图8所示，图案形成装置的图案还将束B2衍射成零级衍射束和第一级衍射束，分别为束DB20和DB21。
The lithographic apparatus according to claim 4, wherein the voltage supply is configured to provide a pulsed voltage difference between the patterning device and ground during operation of the lithographic apparatus, the pulses of voltage difference being synchronized to pulses of the beam of radiation incident on the patterning device.
根据权利要求4所述的光刻设备，其中所述电压源被配置成在所述光刻设备的操作期间在所述图案形成装置和地之间提供脉冲式电压差，所述电压差的脉冲被使得与入射到所述图案形成装置上的辐射束的脉冲同步。
That's a Jacquard card, so that's the patterning device which will actually determine the patterns for the lace.
那是提花纹板 那个提花装置将决定花边的花样
Optical Projection Lithography Masks are used in semiconductor processing, as they are the base patterning device of the IC chip. Defects in masks can be fixed via the use of specialized repair equipment utilizing a very fine focused ion beam.
半导体加工中使用光学投影蚀刻光罩，它们是 IC 芯片的基本布线设备。利用采用非常精密聚焦离子束的专用修补设备，这些光罩的缺陷可以得到修补。
By the appropriate selection of the voltage difference between the patterning device 12 and ground, the contaminant particles charged by the beam of radiation being patterned by the patterning device 12 may be repelled from the patterning device 12 by an electrostatic force.
通过对图案形成装置12和地之间的电压差的适合的选择，通过由图案形成装置12而形成图案的辐射束施以电荷的污染物颗粒可能通过静电力被从图案形成装置12上排斥。
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Rezultate: 11. Exacte: 11. Timp de răspuns: 11 ms.
