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pattern formation method using
Traducere "pattern formation method using" în japoneză
を用いたパターン形成方法
A polymerizable composition for a solder resist, comprising an infrared ray blocking material, a polymerization initiator and a polymerizable compound; and a solder resist pattern formation method using the polymerizable composition for a solder resist.
A resist composition containing a compound represented by general formula (1) or (2), a resist pattern formation method using said resist composition, a polyphenol compound used in the resist pattern formation method, and an alcohol compound capable of being derived from said polyphenol compound.
It is intended to provide a processing liquid for resist substrates, which makes it possible to simultaneously and readily solve the problems of foreign matters sticking to pattern surface, pattern inversion and pattern roughness, and a pattern formation method using the same.
パターン表面の異物、パターン倒れ、およびパターンラフネスの問題を同時に簡便に解決することができるレジスト用基板処理液とそれを用いたパターン形成方法を提供する。
The present invention addresses the problem of providing a composition for forming a resist underlayer film that enables a resist underlayer film to be formed that has excellent etching performance and reduced reflectance, as providing a pattern formation method using the same.
本発明は、エッチング耐性に優れ、反射率が低減されたレジスト下層膜を形成することができるレジスト下層膜形成用組成物、及びそれを用いたパターン形成方法を提供することを課題とする。
Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.
Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition.
Disclosed are: a composition for forming a resist underlayer film for electron beam or EUV lithography, which can be used in a device manufacture process that employs electron beam or EUV lithography, is rarely subjected to the adverse effects of electron beam or EUV, and is effective for the formation of a good resist pattern; and a resist pattern formation method using the composition.
【課題】 電子線やＥＵＶリソグラフィーを用いたデバイス作製工程に用いられる、電子線、ＥＵＶによって及ぼされる悪影響を低減し、良好なレジストパターンを得るのに有効な電子線又はＥＵＶリソグラフィー用レジスト下層膜形成組成物、並びに該レジスト下層膜形成組成物を用いるレジストパターン形成法を提供する。
LITHOGRAPHY RINSING FLUID AND PATTERN FORMATION METHOD USING SAME
リソグラフィー用リンス液およびそれを用いたパターン形成方法
PHOTO MASK, PATTERN FORMATION METHOD USING THE SAME, AND MASK DATA GENERATION METHOD
フォトマスク、そのフォトマスクを用いたパターン形成方法及びマスクデータ作成方法
ALICYCLIC COMPOUND, METHOD FOR MANUFACTURING SAME, COMPOSITION CONTAINING SAME AND RESIST PATTERN FORMATION METHOD USING SAME
ELECTROSTATIC SUCTION TYPE FLUID DISCHARGE DEVICE, ELECTROSTATIC SUCTION TYPE FLUID DISCHARGE METHOD, AND PLOT PATTERN FORMATION METHOD USING THE SAME
静電吸引型流体吐出装置、静電吸引型流体吐出方法、およびそれを用いた描画パターン形成方法
NOVEL SULFONIC ACID SALT AND DERIVATIVE THEREOF, PHOTOACID GENERATOR AGENT, AND RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE PHOTOACID GENERATOR AGENT
新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN-FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION, AND ARTICLE
塩基発生剤、感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、当該感光性樹脂組成物を用いたパターン形成方法並びに物品
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Rezultate: 17. Exacte: 17. Timp de răspuns: 28 ms.
