Moreover, a portion of the first interlayer dielectric material is removed to maintain the spaces at least partially filled with the first interlayer dielectric material and then a second interlayer dielectric material is formed above the first interlayer dielectric material.
The variable resistance structures VR may be provided in a third interlayer dielectric layer 119, e.g., which may be stacked on the first and second interlayer dielectric layers 117 and 118.
The second interlayer dielectric layer 220 may be etched by using a physical etch that uses inert gas, and part of the second interlayer dielectric layer 220 material removed by the etch may be attached on a sidewall dielectric pattern 150.
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Synonyms and analogies of "second interlayer" in English