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A polarity preliminary selection unit (205) generates a polar vector by disposing a unit pulse having a positive or negative polarity, which is selected on the basis of the polarity of an element of the second reference vector, in the position of said element.
The intensity distribution of a first reference light is detected by the first light intensity detection unit and the intensity distribution of a second reference light is detected by the second light intensity detection unit.
A second level shift circuit generates from the second reference signal a third reference signal which has amplitude corresponding to the first power supply voltage.
A mobile character reaching a region as where its distance from the intersection (96) becomes shorter than a second reference distance is moved toward a second motion target position.
In addition, information is acquired concerning a first reference region image and a second reference region image which have a relation wherein positions of pixels which denote the same portion of an object to be displayed deviate in a given direction by a degree corresponding to the reference value.
Furthermore, second stereoscopic image information is generated by the compositing of the first image, the second image, the first reference region image, and the second reference region image.
One end of a long object is positioned by a first reference member, and the other end is positioned by a second reference member.
長尺物の一端を第1基準部材で位置決めし、他端を第2基準部材で位置決めする。
The mobile station transmits cell selection history to the base station of a second cell when handing over the cell selection history, containing a history of cell selection performed in accordance with the first reference for cell reselection in the first state, from a first cell to the second cell in accordance with a second reference for handovers in the second state.
When the reception electric field intensity of the second frequency is lower than a predetermined second reference during the use of the second frequency, the second switch operates to connect the first duplexer to the second front end.
The positional relation between the first reference mark and a second reference mark on a wafer stage (14) side is measured in advance by a calibration mechanism (16) via the projection optical system (11).
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