The patterning may be performed by laser processing.
a patterning device configured to pattern the radiation beam
Seriation skills also help to develop problem-solving skills, which are useful in recognizing and completing patterning tasks.
系统技能也有助于培养解决问题的技能,这对于识别和完成图案化任务是非常有用的。
depositing and patterning a second dielectric layer in contact with the first dielectric layer to form a second via
沉积和图案化与所述第一介电层接触的第二介电层,以形成第二通孔;
patterning both a first and second side of a double-sided magnetic disk with a plurality of substantially identical servo patterns, each servo pattern comprising two servo write assist patterns that are substantially symmetrical to each other about a central burst pattern
a、用多个基本相同的伺服图案构图双面磁盘的第一面和第二面,每个伺服图案包括关于中心脉冲串图案彼此基本对称的两个伺服写入辅助图案;
After patterning the ferroelectric layer 14, a second conductive layer is deposited on top of the patterned ferroelectric layer 14.
在构图铁电层14之后,在构图的铁电层14的顶部沉积第二导电层。
The patterning of proteins has helped the advancement of biosensors., cell biology research, and tissue engineering.
蛋白质的图案形成有助于生物传感器的发展,细胞生物学研究和组织工程。
using a patterning device to provide a radiation beam with a pattern in its cross-section
使用图案形成装置以在辐射束的横截面上给辐射束提供图案;
The arrangement may comprise a beam patterning member positioned between the beam generating unit and the beam sensitive structure and adapted to pattern the beam.
所述装置可以包括射束图案化构件,该射束图案化构件置于射束生成单元和射束敏感结构之间,并且适于图案化所述射束。
In step 808, the corrected beam of radiation is directed onto a patterning device to form a patterned radiation beam.
在步骤808,校正后的辐射束被引导到图案形成装置上以形成图案化的辐射束。
The method of claim 16, wherein patterning said second dielectric material comprises forming a mask from said second dielectric cap material and using said mask as an etch mask for etching said second dielectric material.
如权利要求16所述的方法,其中,图案化该第二介电材料包括自该第二介电覆盖材料形成掩膜并使用该掩膜作为蚀刻掩膜以蚀刻该第二介电材料。
For example, the protective materials may be suspended with carbon nanotubes in the type of ink or paste that is used for screen printing, or is otherwise used for patterning, as described above.
举例而言,该保护材料可与碳奈米管悬浮于用于丝网印刷或(另外)用于图案化之油墨或膏中,如上文所述。
Thereafter, the contact level 204 may be formed on the basis of an appropriate dielectric material or material system in combination with patterning strategies for forming contact elements 207 therein.
之后,该接触层级204可依据适当的介电材料或材料系统并结合用来形成该介电材料中的接触组件207的图案化策略加以形成。